GUANGDONG — Shenzhen Newway Photomask has been officially named a "Guangdong Provincial Manufacturing Single-item Champion " for its high-generation photomasks for displays, one of the province's highest accolades for industrial excellence.

XIAMEN, April 23, 2026 — The Xiamen Newway Photomask High-Generation, High-Precision Production Base, a major industrial project representing a total investment of CNY 2 billion, has officially begun moving in its first batch of core process equipment.

SHANGHAI, March 27 — The three-day global semiconductor flagship event, SEMICON/FPD China 2026, drew to a successful close on Thursday at the Shanghai New International Expo Centre. As one of the most influential gatherings in the global semiconductor industry, the exhibition brought together leading enterprises from across the upstream and downstream supply chains, both domestic and international, to explore new trends in industrial innovation and development.
Shenzhen Newway Photomask Co., Ltd. (stock code: 688401), a listed private company in the display and semiconductor photomask sector, made a powerful impression with its presence at the event.

Recently, the Department of Economy and Information Technology of Sichuan Province officially announced the list of the 2025 Sichuan Provincial First Set Major Technical Equipment, First Batch New Materials , and First Edition Key Software Products. The LTPS (Low Temperature Polycrystalline Silicon) photomask, independently developed and manufactured by NEWWAY, was successfully recognized as one of the Sichuan provincial "First Batch in China" New Material due to its core technological breakthroughs. This recognition signifies another major breakthrough of NEWWAY in the field of core materials for high-end displays, achieving official recognition of its technological strength and industrialization level.

On August 18th, Liu Renyuan, member of the Standing Committee of the Chengdu Municipal Party Committee and Secretary of the Party Working Committee of Chengdu High tech Zone, led a team to visit NEWWAY Optoelectronics Chengdu Base to conduct a special research on "entering enterprises, solving problems, providing excellent services, and promoting development".

On August 11, 2025, at the just concluded DIC EXPO 2025 International Display Technology and Application Innovation Exhibition, NEWWAY Optoelectronics independently developed? The half tone photomask won the highest award at the exhibition, the "Display Material Innovation Gold Award".

On July 9, 2025, the "2025 New Display Industry Supply Chain Technology and Market Matchmaking Exchange Conference" was grandly opened in Changchun. The theme of this conference is "Breaking down Barriers, Strengthening Collaboration, and Smart Future", bringing together leading enterprises in the industry chain such as BOE, Huaxing Optoelectronics, and Tianma Group, as well as upstream and downstream representatives from materials, equipment, research institutions, etc., to jointly explore new paths for innovative development of the display industry. Filling the gap: The award ceremony for the "2024 China New Display Industry Chain Contribution and Collaborative Innovation Project" was held during the authoritative recognition conference for domestic high-end mask plates.

On July 5, 2025, the groundbreaking ceremony for the High Generation High Precision Photomask Project of Xiamen NEWWAY Optoelectronics Co., Ltd. was grandly held in Xiang'an District, Xiamen City. The launch and construction of the project marks a milestone step for China in the key material field of high-end photomask, which is a bottleneck, injecting strong momentum into the independent and controllable development of the new display industry chain.