Persisting in technological R&D and innovation over the years, the company has broken foreign monopolies in G11 photomask manufacturing, full-generation HTM manufacturing, large-size photoresist coating, and accumulated a series of technological achievements, including PSM production, electron beam lithography, dry etching, plasma repair, virtual lithography, inverse lithography, etc.
Currently, the company achieves full-generation and full-technology coverage in the FPD photomask field, accelerates breakthroughs and leads in layout in the semiconductor photomask field, advances towards advanced processes, and plans to complete the production and sales of 28nm semiconductor photomasks, further realizing domestic substitution.