About Newway

As a pioneer in the photomask industry in China, Shenzhen Newway Photomask Making Co., Ltd. is dedicated to the R&D, production, and sales of photomasks. As a key material in the semiconductor and display manufacturing sectors, the company provides specialized photomask products and efficient follow-up services to renowned downstream display panel makers, wafer fabs, IC design houses, and packaging & testing companies. Over nearly three decades, through continuous independent R&D innovation and steady production capacity expansion, Newway has become a leading domestic supplier of high-generation, high-precision flat panel display (FPD) photomasks and advanced packaging photomasks.
In the semiconductor field, Newway's photomasks are comprehensively applied in IC manufacturing, IC devices, advanced packaging, and other areas. The investment in the Suzhou Luxin Semiconductor 130-28nm semiconductor photomask project further refines the company's semiconductor photomask layout, continuously drives photomask technology iteration and upgrades, and promotes the process of domestic substitution to better meet downstream customer demands.
In the display field, Newway's photomasks achieve full-generation coverage (G2.5 to G11) for display panels and support all display technologies (including LCD, AMOLED, LTPS, LTPO, Mini-LED, Micro-LED, Silicon-based OLED, FMM photomasks, etc.). To further expand the production capacity for high-generation, high-precision photomasks, the company has established a presence in Xiamen, constructing the "Xiamen Newway Photomask Making High-Generation, High-Precision Photomask Production Base Project." This project primarily focuses on producing G8.6 and below high-precision photomasks for AMOLED and other applications. It aims to enhance China's core competitiveness in the global display industry chain, responding to the national "Strengthening and Supplementing Industrial Chains" strategy, and contributing to the advancement of China's high-end manufacturing.
Currently, Newway has established an initial large-scale layout, with Shenzhen as its headquarters, and three major production bases in Chengdu, Suzhou, and Xiamen (under construction), along with a Hong Kong subsidiary, Suzhou branch, and Taiwan office. Upholding the business philosophy of "Customer First, People-oriented, NEWWAY Thought, Perfection Pursuit," NEWWAY is committed to building a world-leading enterprise in the photomask industry, repaying society with strength and sincerity.
  • Founded
    1997

    Founded

  • China's First G11 TFT Photomask Production Line
    G11

    China's First G11 TFT Photomask Production Line

  • China's Only Domestic R&D and Manufacturing Enterprise with Full-Generation Photomask Capability
    NO.1

    China's Only Domestic R&D and Manufacturing Enterprise with Full-Generation Photomask Capability

Company Profile
Photomask for Display

Photomask for Display

In the display field (TFT), the company's display photomask has achieved full-generation coverage (G2.5-G11) and full-display technology coverage (LCD, AMOLED, LTPS, LTPO, Mini-LED, Micro-LED, silicon-based OLED, FMM photomasks, etc.).
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Photomask for Semiconductors

Photomask for Semiconductors

In the semiconductor field, NEWWAY's semiconductor photomasks are widely applied in Integrated Circuits (IC), semiconductor devices, advanced packaging, and more. Through the investment in Luxin Semiconductor, the company's semiconductor photomask layout has advanced to the 40nm process node, with future plans to extend further to the 28nm node.
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APPLICATION AREAS

Large-Size HD Display & Touch
Large-Size HD Display & Touch
IC Devices
IC Devices
IC Packaging
IC Packaging
Integrated Circuit Manufacturing
Integrated Circuit Manufacturing

News

Newway Photomask Takes Stage at 14th Western China Electronics Expo, Shares How Advanced Photomasks Fortify the "Lithography Cornerstone" of Electronic Innovation

CHENGDU, July 15, 2026 — The opening ceremony of the 14th China (Western) Electronics Information Expo and the 2026 Chengdu-Chongqing Electronic Information Industry Ecosystem Cooperation Conference was held this morning at the Century City New International Convention and Exhibition Center.
2026-07-17

Newway Photomask Honoured as "Guangdong Provincial Manufacturing Single-item Champion"

GUANGDONG — Shenzhen Newway Photomask has been officially named a "Guangdong Provincial Manufacturing Single-item Champion " for its high-generation photomasks for displays, one of the province's highest accolades for industrial excellence.
2026-05-13

CNY 2 Billion Investment: Xiamen Newway Photomask Project Commences Equipment Move-In Ceremony

XIAMEN, April 23, 2026 — The Xiamen Newway Photomask High-Generation, High-Precision Production Base, a major industrial project representing a total investment of CNY 2 billion, has officially begun moving in its first batch of core process equipment.
2026-05-13

Newway Photomask Wraps Up Successful Run at SEMICON/FPD China 2026

SHANGHAI, March 27 — The three-day global semiconductor flagship event, SEMICON/FPD China 2026, drew to a successful close on Thursday at the Shanghai New International Expo Centre. As one of the most influential gatherings in the global semiconductor industry, the exhibition brought together leading enterprises from across the upstream and downstream supply chains, both domestic and international, to explore new trends in industrial innovation and development.
Shenzhen Newway Photomask Co., Ltd. (stock code: 688401), a listed private company in the display and semiconductor photomask sector, made a powerful impression with its presence at the event.
2026-03-31