In the semiconductor field, adhering to the "Leveraging Display to Drive Semiconductor" development strategy, the company has established good cooperative relationships with domestic mainstream specialty wafer manufacturers and chip design companies. Currently, the company has achieved mass production of 180nm process node semiconductor photomasks; 150nm/130nm have passed customer validation and are in small-volume mass production. Simultaneously, the semiconductor photomask manufacturing technologies mastered by the company can cover third-generation semiconductor-related products. Products are fully applied in IC manufacturing, IC devices, advanced packaging, etc., meeting the needs of advanced semiconductor chip packaging, semiconductor devices, MEMS sensors, RF chips, silicon-based OLED, and other applications, providing crucial upstream material localization support for China's semiconductor industry development.

The Luxin Semiconductor photomask project and constructed by the company is progressing smoothly, and the process node layout ranks among the top in domestic manufacturers. I of the project covers 130-40nm process node semiconductor photomasks. In H1 2025, major equipment like the electron beam lithography system for Phase I arrived at the factory progressively and were put into production orderly; 90nm and above semiconductor photomasks have been successively sent to customers for sampling and passed validation by some clients. According to the plan, trial production of 40nm semiconductor photomasks will commence in H2 2025, with the future goal of completing production and sales of 28nm advanced process semiconductor photomasks. As the project successfully commences production, the company's products will gradually cover semiconductor manufacturing-related industries such as MCU, SiPh, CIS, BCD, DDIC, MS/RF, Embedded NVM, NOR/NAND Flash, further improving the industrial supply chain and promoting the domestic substitution process.