The company provides Photomask Design Rule Check services. Customers can perform rule checks on data through DRC to prevent anomalies during the manufacturing process.

It is a key technology to ensure high-fidelity patterns on silicon wafers by accurately correcting the photomask pattern in advance to compensate for optical distortions during lithography.
In addition, the company can also provide data processing services such as Format Transferring, Density, Bias, Mirror, Scaling, Boolean, Array Reference, Difference, Reticle Alignment Mark, Barcode, ESD and other data processing services.

The company provides Job Deck View service. Customers can confirm design documents through online JDV methods. The file formats that the company can support include MEBES, GDSII, OASIS, DWG, CIF, TDB, DPF, etc.

Customers can clean the particles on the surface of the photomask through the photomask cleaning service, and re-test and measure the product to confirm whether the product can continue to be used.

Customers can use the heavy film application service to remove scratched, damaged, torn, and dirty optical films, and then re-film them after cleaning and testing.

The company provides local photomask repair services. Customers can repair the defects in local areas of the chromium film by providing enlarged pictures of local phenomena in the area that need to be repaired, or after returning to the factory to the company for inspection and evaluation.