On the morning of January 28, a delegation led by Mr. Cunhao Fang, Party Committee Secretary of Chengdu Hi-tech Industrial Development Zone, and Mr. Jidong Zhao, Party Committee Member and Deputy Director of the Administrative Committee, visited Chengdu Newway Photomask Making Co., Ltd. for a research visit. Principal officials from the Electronic Information Industry Development Bureau, Planning and Natural Resources Construction Bureau, and Economic Operation and Work Safety Supervision Bureau of the Hi-tech Zone participated in the research. They were accompanied by Mr. Wubing Du, Chairman and General Manager; Ms. Qing Xiao, Executive Deputy General Manager; and Mr. Junrong Chen, Assistant General Manager of Chengdu Newway.

On January 23, 2019, Chengdu Newway Photomask Making Co., Ltd. (hereinafter referred to as "Chengdu Newway"), located in the West Hi-tech Zone of Chengdu, reached a significant milestone since the commencement of its construction: the successful roll-off of the first photomask product from China's first G11 high-generation photomask project. This marks the official birth of China's first independently researched, developed, and manufactured high-precision 11th-generation photomask! The achievement signifies China's inaugural capability for mass production of photomasks for ultra-large-size panels, realizing the domestic production of ultra-high-generation photomasks. According to the technical lead at Chengdu Newway, "The G11 photomask product meets internationally advanced levels across various specifications within the industry, with some parameters even surpassing international standards."

On November 15, 2018, the 14th China International Display Conference (CIDC 2018), themed "LCD Technology Changing Human Life," was grandly held at the Wuzhou Hotel to commemorate the 50th anniversary of the invention of liquid crystal display technology. As an innovative enterprise promoting the localization of upstream materials in China's display industry, Newway Photomask Making was invited to participate. Mr. Wei Lin, Executive Deputy General Manager, delivered an insightful presentation titled "Application of Photomask Technology in High-Generation Panel Fields."

At 8:40 AM on September 27, the equipment for Phase I of the G11 high-generation photomask project was successfully moved into the high-class cleanroom at Chengdu Newway Photomask Making Co., Ltd. (hereinafter referred to as "Chengdu Newway"), located in the West Hi-tech Zone of Chengdu. This marks a significant milestone towards the completion and operational launch of China's first G11 photomask project. The project now enters the intensive phase of equipment installation and debugging, bringing it one step closer to the official production of G11 photomask products.
Since its groundbreaking on January 18, 2018, the main building for Phase I of Chengdu Newway's G11 project achieved roof closure within six months. Within eight months, the cleanroom and electromechanical power facilities met the conditions for process equipment move-in. The entry of this batch of process equipment lays a solid foundation for the project's operational launch.

On July 23, 2018, with the pouring of the final roof concrete slab completed, the main building for the G11 photomask production line at Chengdu Newway Photomask Making Co., Ltd. (hereinafter referred to as "Chengdu Newway") in Chengdu's West Hi-tech Zone successfully achieved roof closure. This marks a solid step forward in the construction of China's first G11 photomask project, which will now enter the cleanroom finishing stage, with main equipment scheduled for installation and commissioning in September.