Chengdu Newway Photomask Making' independently developed G11 and G8.5 generation photomasks have been recognized as "Sichuan Province's First (Batch) Major Technical Equipment Products Domestically in 2022," an honor conferred by the Sichuan Provincial Department of Economy and Information Technology and the Sichuan Provincial Department of Finance.

On April 28, 2021, the "2021 China Display Industry Supply Chain Technology and Market Exchange Conference" and the "Fourth (2020) China New Display Industry Chain Contribution Awards" ceremony, organized by the China Electronic Materials Industry Association and the Liquid Crystal Branch of the China Optics and Optoelectronics Manufacturers Association, were grandly held in Wuhan, Hubei Province.

On April 9, 2021, Major General Jian Luo, the eldest son of General Ruiqing Luo, one of the founding generals of the People's Republic of China, visited Chengdu Newway Photomask Making Co., Ltd., accompanied by a delegation of five. They were warmly received by Ms. Yun Zhang, Director of the Chairman's Office of Chengdu Newway Photomask Making.

President Wenwu Ding Delivering Address; Chairman Wubing Du Giving Welcome Remarks; Certificate and Appointment Letter Presentation; Secretary-General Baoqin Chen Delivering Report; Experts and Leaders Providing Guidance at Chengdu Newway.

From November 9 to 10, the inaugural meeting of the Sub-Technical Committee on Microlithography under the National Technical Committee for Semiconductor Equipment and Materials Standardization and the 10th Microlithography Technology Exchange Conference were grandly held in Chengdu. The event was hosted by Chengdu Newway Photomask Making Co., Ltd. Nearly 200 elite representatives from academia, research, investment, and other sectors related to global semiconductor and integrated circuit microlithography gathered to discuss hot topics such as the development of the global semiconductor integrated circuit industry, cutting-edge technologies, and industrial innovation, jointly promoting industry exchange and collaborative innovation.

November 1 marked Shenzhen's fourth "Talent Day" and the third anniversary of Shenzhen Talent Park. At 3:00 PM that day, the Shenzhen Talent Gallery located within the park officially opened! As a key enterprise in Nanshan District, Newway Photomask Making was invited to attend the opening ceremony.
Mr. Shubin Yin, Deputy Secretary of the Nanshan District Party Committee, stated in his address that the "Shenzhen Talent Gallery" pioneers a new integrated model combining talent promotion, science outreach, and enterprise services. It provides a new window for talent promotion, creates a new base for science popularization, and establishes a new platform for corporate services. Nanshan District remains committed to implementing a talent-first development strategy, fostering an environment that respects knowledge, talent, and creativity, and building a Central Intelligence District comparable to world-renowned sci-tech innovation hubs.

On August 20, 2020, the "China Display Industry Supply Chain Technology and Market Exchange Conference" and the awards ceremony for the "Third (2019) China New Display Industry Chain Contribution Awards," organized by the China Electronic Materials Industry Association and the Liquid Crystal Branch of the China Optics and Optoelectronics Manufacturers Association, were grandly held in Ningbo, Zhejiang Province.

On March 5, the Department of Science and Technology of Guangdong Province issued document Yue Ke Han Chan Zi [2020] No. 141, announcing the list of recognized Guangdong Provincial Engineering Technology Research Centers for 2019. The "Guangdong Provincial Engineering Technology Research Center for Ultra-High Precision Laser-Processed Photomasks" successfully passed the expert review and certification by the Department of Science and Technology of Guangdong Province.