Development Course
Shenzhen NEWWAY was founded.
Achieved mass production of FILM photomask products.
Successfully developed and mass-produced the APR (Advanced Photoresist) Plate project.
Industrialized the high-precision photomask project.
The first photomask production line was established.
Obtained certification as a Shenzhen High-Tech Enterprise.
Completed the development of photomask products for G2.5 TFT-LCD and G5.5 Metal Mesh applications.
Obtained certification as a National High-Tech Enterprise.
Built and achieved mass production for a large-size Touch Panel (TP) photomask production line.
Completed the development of photomask products for G4.5-G6 TFT-LCD applications.
Signed an industry-academia-research strategic alliance agreement with the College of Optoelectronic Engineering, Shenzhen University.
Completed the development of photomask products for AMOLED applications.
Completed the development of semiconductor photomask products for the 180nm node.
Construction commenced on China's first photomask project for G11 applications.
Completed the development of semiconductor photomask products for the 150nm node.
The first domestically produced photomask for G11 applications rolled off the production line, breaking the foreign monopoly and filling a domestic gap.
The Guangdong Provincial Engineering Technology Research Center for Ultra-High Precision Laser-Processed Photomasks was officially approved.
Signed a key R&D cooperation agreement in high-tech fields with the University of Electronic Science and Technology of China.
Shenzhen Newway Photomask Making Co., Ltd. successfully listed on the STAR Market, stock code: 688401.
Shenzhen NEWWAY was recognized as a "2023 High-Quality Development Benchmark Enterprise in the Guangdong-Hong Kong-Macao Greater Bay Area."
The Jiangsu Luxin Semiconductor Photomask project, in which the company invested, commenced construction.
Xiamen Newway Photomask Making High-Generation, High-Precision Photomask Project Breaks Ground.
